Structural and electrical properties of Ti-Al thin films Shenzhen Sunrise Metal Industry Co.,Ltd 深圳市东升稀有金属有限公司
skype :Li.mary9
QQ : 1957953030
We have studied thin films of Ti-Al for use as resistance elements. It was found that Ti-40 wt.% Al thin films with a resistivity of 10 ω/□ possess stable characteristics. We have also studied the structure of Ti-Al thin films. Analysis of electron and X-ray diffraction patterns showed that Ti-40 wt.% Al films contained a fine-grained disordered intermetallic face-centred cubic TiAl phase whereas bulk TiAl had a tetragonal CuAu-type structure.
没有评论:
发表评论